The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.
Date & Location: 04-07 August, Helsinki, Finland
SparkNano’s contribution
We are excited to share that our CTO, Paul Poodt will be one of the speakers delivering an insightful presentation on August 6th from 8.30 am and moderator on August 7th from 8.00 am at the conference this year. For the precise program schedule, please refer to the following information or visit our website at https://ald2024.avs.org/wp-content/uploads/2024/04/Technical-Program.pdf. During the event, he will be also open to discussing your specific questions and the benefits of SparkNano’s Spatial ALD technology.
Presenter:
8.30 – 8.45 AM, Tuesday, 6 August, 2024 – Room Hall 3E
AM-TuM-3 Optimizing Precursor Utilization for Spatial ALD in High Surface Area
Moderator:
8.00 – 10.00 AM, Wednesday, 7 August, 2024 – Room Hall 3D
Emerging Materials – Session EM-WeM
Molecular Layer Deposition of Organic Materials and Organic-Inorganic Hybrid Materials
Chief Technological Officer
Do not miss the opportunity to attend the conference and schedule a meeting with our team
Schedule a meeting with our experts at the conference ahead to learn more about our unique Spatial ALD technology and state-of-the art product portfolio