Spatial Atomic Layer Deposition
Highly reduced use of scarce materials while maintaining excellent performance.
The quest for a sustainable planet
At SparkNano, we believe that our Spatial Atomic Layer Deposition (ALD) technology can support the quest for a sustainable planet and the development of better, cheaper and higher-performing materials for the hydrogen, battery, fuel cell, display and solar markets.
The next-generation energy- and display devices
By commercializing the Spatial ALD technology, we provide state-of-the-art lab and fab equipment for our customers to design and mass-produce the next-generation energy- and display devices with a highly reduced use of scarce materials while maintaining excellent performance.
Benefits of Spatial ALD compared to conventional ALD
Traditional ALD
- High-quality 3D layers and suitable for porous substrates
- Limited deposition speed
- Limited in maximum substrates
Spatial ALD
- High-quality 3D layers and suitable for porous substrates
- A 100 times faster deposition speed than conventional ALD by our spatial technology in combination with proprietary plasma enhanced deposition
- Scalable to large areas & flexible substrates
- Industrially proven, cost-efficient mass production
Fast
As there is no need for time consuming purge steps, deposition times become minutes instead of hours
Scalable
The deposition area / print head can be scaled as wide as desired, making it possible to do Spatial ALD on substrates up to meters wide, as well as on rolls of flexible foils
Efficient
No deposition on reactor walls, only on the substrate. Furthermore, the separated flow of precursors enables recovery of unreacted precursor from the waste flows
Versatile
On top of the known ALD benefits like uniformity and conformality, SparkNano’s technology includes unique features such as mask-less patterned deposition and co-dosing
How Spatial ALD works
At SparkNano, we do Spatial ALD. Instead of a vacuum chamber we use – what can best be described – as an ALD print head. Through this print head, we supply the gaseous precursors separated from each other by shields of inert gas.
The print head floats above the substrate, and when the substrate and print head move with respect to each other, an ALD film is deposited.
