Spatial Atomic Layer Deposition

Spatial ALD offers the ability to deposit ultra-thin layers at higher deposition rates, while highly reducing the use of scarce materials, and maintaining excellent performance.

Discover how Spatial ALD solves the global iridium challenge to unlock for the scaling up of green hydrogen, by accessing the article below.

spatial atomic layer deposition-technology
spatial ald saves scarce materials

The quest for a sustainable planet

At SparkNano, we believe that our Spatial Atomic Layer Deposition (ALD) technology can support the quest for a sustainable planet and the development of better, cheaper and higher-performing materials for the hydrogen, battery, fuel cell, display and solar markets.   

The next-generation energy- and display devices

By commercializing the  Spatial ALD technology, we provide state-of-the-art lab and fab equipment for our customers to design and mass-produce the next-generation energy- and display devices with a highly reduced use of scarce materials while maintaining excellent performance. 

spatial ald the new technology of the future

Interview: Hydrogen Standard

In a recent discussion with Hydrogen Standard, our Chief Commercial Officer Koen Driessen, delved into insights and shared his perspective on why the current landscape holds particular promise for SparkNano’s Spatial ALD technology.

Exclusive interview

with our CCO, Koen Driessen, conducted by Johann Wiebe from Hydrogen Standard,

Benefits of Spatial ALD compared to conventional ALD

Traditional ALD

  • High-quality 3D layers and suitable for porous substrates
  • Limited deposition speed
  • Limited in maximum substrates

Spatial ALD

  • High-quality 3D layers and suitable for porous substrates
  • A 100 times faster deposition speed than conventional ALD by our spatial technology in combination with proprietary plasma enhanced deposition
  • Scalable to large areas & flexible substrates
  • Industrially proven, cost-efficient mass production 

Fast

As there is no need for time consuming purge steps, deposition times become minutes instead of hours


Scalable

The deposition area / print head can be scaled as wide as desired, making it possible to do Spatial ALD on substrates up to meters wide, as well as on rolls of flexible foils 


Efficient

No deposition on reactor walls, only on the substrate. Furthermore, the separated flow of precursors enables recovery of unreacted precursor from the waste flows


Versatile

On top of the known ALD benefits like uniformity and conformality, SparkNano’s technology includes unique features such as mask-less patterned deposition and co-dosing

How Spatial ALD works

At SparkNano, we do Spatial ALD.  Instead of a vacuum chamber we use – what can best be described – as an ALD print head. Through this print head, we supply the gaseous precursors separated from each other by shields of inert gas.

The print head floats above the substrate, and when the substrate and print head move with respect to each other, an ALD film is deposited.

Find out how our technology can help you innovate