Research and development system
SparkNano LabLine™ system
SparkNano’s LabLine™ system delivers industry-leading Spatial Atomic Layer Deposition (S-ALD) systems, combining superior film quality with the fastest deposition speeds and unmatched flexibility. These advanced systems are designed to support a wide range of spatial ALD processes and accommodate various substrate types, making them the ideal solution for R&D, process development, product development, and even pilot-line production.
Furthermore, the SparkNano LabLine™ system is fully scalable, bridging the gap between laboratory research and full-scale manufacturing, ensuring a smooth and seamless transition to commercial production. The SparkNano LabLine™ system is composed of several key components, each designed to deliver maximum performance and flexibility for a variety of spatial ALD applications. These components can be customized or upgraded based on specific process requirements, ensuring the system adapts to your evolving needs.
Key Specification of the SparkNano LabLine™ System
Substrate types
Planar and porous substrates, including wafers, glass, metal, and polymer foils
Precursors and Co-reactants
Precursors: Standard setup with up to four precursor connections. Co-reactants: H₂O (standard), Plasma (optional O₃, H₂, O₂) (Additional precursors and co-reactants available upon request.)
Free Sample Area
Maximum 420 mm x 300 mm
Deposition Temperature
Thermal S-ALD 50°C – 250°C
Plasma-Enhanced S-ALD 50°C – 200°C
Substrate Loading
Manual, via two antechambers (one small, one large)
System Dimensions
4.0 m (W) x 3.6 m (D) x 2.1 m (H)
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for the SparkNano LabLine™ now.
Other SparkNano spatial ALD solutions
SparkNano Omega™
Proven roll-to-roll (R2R) system for ultra-high-volume Spatial ALD production on flexible foils
See product