The AVS 23rd International Conference on Atomic Layer Deposition (ALD 2023) featuring the 10th International Atomic Layer Etching Workshop (ALE 2023) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, July 23-Wednesday, July 26, 2023, at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).
Date & Location: 23-26th July, Bellevue, Washington, USA
Join SparkNano at the AVS 23rd International Conference on Atomic Layer Deposition & the 10th International Atomic Layer Etching Workshop from July 23-26 in Bellevue, Washington, USA!
Don’t miss the opportunity to attend and schedule a meeting with our CTO, Paul Poodt. He will be delivering a presentation on July 26th at 9:45 am, titled “Spatial ALD of Iridium Oxide Electro-Catalyst Layers for PEM Electrolysis.”
In addition, we are thrilled to announce that Mike van de Poll, a student from Eindhoven University of Technology, the Netherlands, has been selected as a finalist for the Student Award. Mike’s talk, “Conformality of Atmospheric-Pressure Plasma-Enhanced Spatial Atomic Layer Deposition of SiO2 and TiO2,” will demonstrate how SparkNano’s atmospheric plasma source can be used to achieve excellent conformality during Spatial ALD.
Join us at the the AVS 23rd International Conference on Atomic Layer Deposition
Do not miss the opportunity! Schedule a meeting with our experts at the conference ahead to learn more about our unique Spatial ALD technology and state-of-the art product portfolio.